Patent · US Active

Accuracy improvements in optical metrology

US11862522B2 · kind B2 · utility

0Cited by

1References

9Claims

0Family size

Inventors

Barak Bringoltz · Rehovot, IL
Evgeni Gurevich · Givatayim, IL
Ido Adam · Kiryat Ono, IL
Yoel Feler · Haifa, IL
Dror Alumot · Rehovot, IL
Yuval Lamhot · Haifa, IL
Noga Sella · Migdal HaEmek, IL
Yaron De Leeuw · Yehud Monosson, IL
Tal Yaziv · Kiryat Motzkin, IL
Eltsafon Ashwal-Island · Haifa, IL
Lilach Saltoun · Kiryat Ono, IL
Tom Leviant · Yoqneam Illit, IL

Key dates

Filing date	Feb 18, 2021
Grant date	Jan 2, 2024
Priority date	—
Expiry date	Apr 19, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01L22/12
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.