Quick adjustment of metrology measurement parameters according to process variation
US10699969B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2018 |
| Grant date | Jun 30, 2020 |
| Priority date | — |
| Expiry date | Apr 9, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods applicable in metrology modules and tools are provided, which enable adjusting metrology measurement parameters with respect to process variation, without re-initiating metrology recipe setup. Methods comprise, during an initial metrology recipe setup, recording a metrology process window and deriving baseline information therefrom, and during operation, quantifying the process variation with respect to the baseline information, and adjusting the metrology measurement parameters within the metrology process window with respect to the quantified process variation. The quick adjustment of metrology parameters avoids metrology-related process delays and releases prior art bottlenecks related thereto. Models of effects of various process variation factors on the metrology measurements may be used to enhance the derivation of required metrology tuning and enable their application with minimal delays to the production process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.