Patent · US Active

Device for determining a tilt angle of at least one mirror of a lithography system, and method

US10007195B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jan Horn · Munich, DE
Markus Holz · Aalen, DE
Joerg Specht · Oberkochen, DE

Key dates

Filing date	May 3, 2016
Grant date	Jun 26, 2018
Priority date	—
Expiry date	May 3, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0833
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An apparatus for establishing a tilt angle of at least one mirror of a lithography installation is disclosed. The apparatus includes a pattern generating device (6) for generating a pattern. The apparatus also includes an image acquisition device for acquiring the generated pattern which was reflected by the mirror. The apparatus further includes a comparator device for providing a comparison result in a manner dependent on a comparison of the acquired pattern with a reference pattern. In addition, the apparatus includes an evaluation device for establishing the tilt angle in a manner dependent on the comparison result. The image acquisition device and the comparator device are provided in the same integrated circuit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.