Homogenization of light beam for spectral feature metrology
US10012544B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 29, 2016 |
| Grant date | Jul 3, 2018 |
| Priority date | — |
| Expiry date | Jan 11, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/225
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology system is used for measuring a spectral feature of a pulsed light beam. The metrology system includes: a beam homogenizer in the path of the pulsed light beam, the beam homogenizer having an array of wavefront modification cells, with each cell having a surface area that matches a size of at least one of the spatial modes of the light beam; an optical frequency separation apparatus in the path of the pulsed light beam exiting the beam homogenizer, wherein the optical frequency separation apparatus is configured to interact with the pulsed light beam and to output a plurality of spatial components that correspond to the spectral components of the pulsed light beam; and at least one sensor that receives and senses the output spatial components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.