Thomas Patrick Duffey
34Patents
8h-index
78Co-inventors
78Inventor score
Filing activity: Sep 18, 1998 → Oct 21, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6128323A | Reliable modular production quality narrow-band high REP rate excimer laser | Electricity | 171 | Expired |
| US6018537A | Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser | Electricity | 161 | Expired |
| US6240117A | Fluorine control system with fluorine monitor | Electricity | 102 | Expired |
| US6330261A | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser | Electricity | 60 | Expired |
| US6757316B2 | Four KHz gas discharge laser | Electricity | 52 | Expired |
| US6370174B1 | Injection seeded F2 lithography laser | Electricity | 51 | Expired |
| US6034978A | Gas discharge laser with gas temperature control | Electricity | 38 | Expired |
| USRE38054E1 | Reliable, modular, production quality narrow-band high rep rate F2 laser | General | 22 | Expired |
| US6330260A | F2 laser with visible red and IR control | Electricity | 7 | Expired |
| US9599510B2 | Estimation of spectral feature of pulsed light beam | Physics | 4 | Active |
| US8284815B2 | Very high power laser chamber optical improvements | Electricity | 3 | Active |
| US11054665B2 | Reducing speckle in an excimer light source | Electricity | 1 | Active |
| US10345714B2 | Lithography optics adjustment and monitoring | Physics | 1 | Active |
| US10228322B2 | Apparatus for and method of sensing fluorine concentration | Physics | 1 | Active |
| US11526083B2 | Spectral feature selection and pulse timing control of a pulsed light beam | Electricity | 1 | Active |
| US8982922B2 | Very high power laser chamber optical improvements | Electricity | 1 | Active |
| US9246298B2 | Corrosion resistant electrodes for laser chambers | Electricity | 1 | Active |
| US10451890B2 | Reducing speckle in an excimer light source | Electricity | 1 | Active |
| US9945730B2 | Adjusting an amount of coherence of a light beam | Electricity | 1 | Active |
| US7301980B2 | Halogen gas discharge laser electrodes | Electricity | 1 | Expired |
| US7995637B2 | Gas discharge laser chamber | Electricity | 1 | Active |
| US10845711B2 | Lithography optics adjustment and monitoring | Physics | 0 | Active |
| US11777271B2 | Method of and apparatus for extending electrode life in a laser chamber | Electricity | 0 | Active |
| US12374853B2 | Control system for a plurality of deep ultraviolet optical oscillators | Electricity | 0 | Active |
| US11686951B2 | Reducing speckle in an excimer light source | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.