Patent · US Active

Optical system of a microlithographic projection exposure apparatus

US10012907B2 · kind B2 · utility

0Cited by

4References

15Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Deguenther · Aalen, DE
Thomas Korb · Schwäbisch Gmünd, DE

Key dates

Filing date	Dec 6, 2016
Grant date	Jul 3, 2018
Priority date	—
Expiry date	Dec 6, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70241
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system of a microlithographic projection exposure apparatus designed for an operating wavelength of at least 150 nm. In one disclosed aspect, the optical system includes an element (11, 21) producing an angular distribution for light incident during the operation of the optical system and a fly's eye condenser (200, 400, 500) which includes two arrangements (210, 220, 410, 420, 510, 520) following one another in the light propagation direction and made of beam-deflecting optical elements (211-213, 221-223, 411-413, 421-423, 511-513, 521-523), which produce a multiplicity of optical channels. No optical element with refractive power is arranged in the beam path between the element (11, 21) producing an angular distribution and the fly's eye condenser (200, 400, 500).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.