Method of operating a microlithographic projection apparatus

US10018907B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Boris Bittner · Roth, DE
• Norbert Wabra · Werneck, DE
• Sonja Schneider · Lehrberg, DE
• Ricarda Schoemer · Zusmarshausen, DE
• Martin von Hodenberg · Oberkochen, DE

Key dates

• Filing date: Feb 11, 2016
• Grant date: Jul 10, 2018
• Expiry date: Mar 23, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G06F2119/18
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of operating a microlithographic projection exposure apparatus includes, in a first step, providing a projection objective that includes a plurality of real manipulators. In a second step, a virtual manipulator is defined that is configured to produce preliminary control signals for at least two of the real manipulators. In a third step, performed during operation of the apparatus, a real image error of the projection objective is determined. In a fourth step, a desired corrective effect is determined. In a fifth step, first virtual control signals for the virtual manipulator are determined. In a sixth step, second virtual control signals for the real manipulators are determined.