Patent · US Active

Substrate support assembly with deposited surface features

US10020218B2 · kind B2 · utility

10Cited by
52References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 17, 2015
Grant dateJul 10, 2018
Priority date
Expiry dateAug 2, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH02N13/00
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of manufacturing an electrostatic chuck includes polishing a surface of a ceramic body of the electrostatic chuck to produce a polished surface and depositing a ceramic coating onto the polished surface of the ceramic body to produce a coated ceramic body. The method further includes disposing a mask over the coated ceramic coating, the mask comprising a plurality of elliptical holes and depositing a ceramic material through the plurality of elliptical holes of the mask to form a plurality of elliptical mesas on the coated ceramic body, wherein the plurality of elliptical mesas have rounded edges. The mask is then removed from the coated ceramic body and the plurality of elliptical mesas are polished.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.