Patent · US Active

On-product derivation and adjustment of exposure parameters in a directed self-assembly process

US10025285B2 · kind B2 · utility

0Cited by

1References

16Claims

0Family size

Assignee

KLA-TENCOR CORPORATION · US

Inventors

Roie Volkovich · Migdal HaEmek, IL
Eran Amit · Haifa, IL
Nuriel Amir · Yoqneam Illit, IL
Michael Adel · Zichron Ya'akov, IL

Key dates

Filing date	Jun 30, 2015
Grant date	Jul 17, 2018
Priority date	—
Expiry date	Apr 12, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG05B2219/33285
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Methods and metrology tool modules embodying the methods are provided. Methods comprise measuring characteristics of intermediate features such as guiding lines in a directed self-assembly (DSA) process, deriving exposure parameters from the measured characteristics; and adjusting production parameters for producing consecutive target features according to the derived exposure parameters. The methods and modules enhance the accuracy of the DSA-produced structures and related measurements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.