Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
US10026592B2 · kind B2 · utility
32Cited by
39References
20Claims
0Family size
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Key dates
| Filing date | Jul 1, 2016 |
| Grant date | Jul 17, 2018 |
| Priority date | — |
| Expiry date | Jul 2, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/327
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods for controlling a process applied to a substrate within a plasma chamber are described. The systems and methods include generating and supplying odd harmonic signals and summing the odd harmonic signals to generate an added signal. The added signal is supplied to an electrode within the plasma chamber for processing the substrate. The use of odd harmonic signals facilitates high aspect ratio etching of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.