Zhigang Chen
90Patents
16h-index
124Co-inventors
87Inventor score
Filing activity: May 9, 2000 → Apr 17, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9741546B2 | Symmetric plasma process chamber | Electricity | 365 | Active |
| US9852889B1 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Electricity | 105 | Active |
| US6680976B1 | Robust, reliable compression and packetization scheme for transmitting video | Electricity | 87 | Expired |
| US9536749B2 | Ion energy control by RF pulse shape | Electricity | 57 | Active |
| US10115568B2 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Electricity | 47 | Active |
| US8313664B2 | Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber | Electricity | 35 | Active |
| US8933628B2 | Inductively coupled plasma source with phase control | Electricity | 35 | Active |
| US10546728B2 | Symmetric plasma process chamber | Electricity | 35 | Active |
| US10580620B2 | Symmetric plasma process chamber | Electricity | 33 | Active |
| US10453656B2 | Symmetric plasma process chamber | Electricity | 33 | Active |
| US10535502B2 | Symmetric plasma process chamber | Electricity | 32 | Active |
| US10026592B2 | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing | Electricity | 32 | Active |
| US9385021B2 | Electronic knob for tuning radial etch non-uniformity at VHF frequencies | Electricity | 27 | Active |
| US9705289B2 | High brightness multijunction diode stacking | Electricity | 22 | Active |
| US9578722B2 | Methods for selecting and controlling devices | Physics | 19 | Active |
| US9096773B2 | Highly functional epoxidized resins and coatings | Chemistry; Metallurgy | 16 | Active |
| US7394535B1 | Optical metrology using a photonic nanojet | Physics | 16 | Active |
| US9862141B2 | Selective laser-assisted transfer of discrete components | Electricity | 13 | Active |
| US9620334B2 | Control of etch rate using modeling, feedback and impedance match | Electricity | 13 | Active |
| US8206552B2 | RF power delivery system in a semiconductor apparatus | Electricity | 8 | Active |
| US8920597B2 | Symmetric VHF source for a plasma reactor | Electricity | 6 | Active |
| US10283330B2 | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators | Electricity | 5 | Active |
| US10833482B2 | Diode laser apparatus with FAC lens out-of-plane beam steering | Electricity | 5 | Active |
| US10615003B2 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Electricity | 5 | Active |
| US10002746B1 | Multi regime plasma wafer processing to increase directionality of ions | Electricity | 4 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.