Patent · US Active

External clamp ring for a chemical mechanical polishing carrier head

US10029346B2 · kind B2 · utility

1Cited by

14References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Patrick Ala · San Jose, US
Bo Ding · Los Angeles, US
Yongqi Hu · Campbell, US
Simon Yavelberg · Cupertino, US
Mats Larsson · Kalmar, SE

Key dates

Filing date	Jun 8, 2016
Grant date	Jul 24, 2018
Priority date	—
Expiry date	Jun 20, 2036

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24B37/32
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

An external clamp ring for a chemical mechanical polishing (CMP) carrier head having a hydrophobic coating, and a carrier head having the same are described herein. In one embodiment, an external clamp ring is provided that includes a cylindrical body having an outer cylindrical wall and an inner cylindrical wall. A hydrophobic layer disposed is on the outer cylindrical wall.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.