Method for protecting layer by forming hydrocarbon-based extremely thin film
US10043661B2 · kind B2 · utility
447Cited by
710References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 1, 2016 |
| Grant date | Aug 7, 2018 |
| Priority date | — |
| Expiry date | Sep 1, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/2254
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for protecting a layer includes: providing a substrate having a target layer; depositing a protective layer on the target layer, which protective layer contacts and covers the target layer and is constituted by a hydrocarbon-based layer; and depositing an oxide layer on the protective layer so that the protective layer in contact with the oxide layer is oxidized. The hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.