Substrate liquid processing apparatus
US10056269B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2015 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Mar 19, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Gas-liquid separation of an exhaust gas from a liquid processing unit can be improved. A substrate liquid processing apparatus includes a liquid processing unit, a first exhaust pipe and a second exhaust pipe. The liquid processing unit is configured to process a substrate with a processing liquid. At least a part of the first exhaust pipe at is located above the liquid processing unit. One end of the second exhaust pipe is connected to the liquid processing unit, and the second exhaust pipe is configured to evacuate the liquid processing unit through the first exhaust pipe by an exhaust device. Further, the other end of the second exhaust pipe is connected to a portion of the first exhaust pipe which is located above the liquid processing unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.