Patent · US Active

Reflective optical element

US10061205B2 · kind B2 · utility

1Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dirk Heinrich Ehm · Beckingen, DE
Moritz Becker · Stuttgart, DE
Irene Ament · Aalen, DE
Gisela Von Blanckenhagen · Aalen, DE
Joern WEBER · Aalen, DE

Key dates

Filing date	Feb 15, 2017
Grant date	Aug 28, 2018
Priority date	—
Expiry date	Feb 15, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A reflective optical element, in particular for a microlithographic projection exposure apparatus has a substrate (101), a reflection layer system (110) and a defect structure (120) of channel-shaped defects (121) which extend inward from the optical effective surface (100a), or from an interface oriented toward the substrate as far as the reflection layer system, and permit egress of hydrogen from the reflection layer system. The channel-shaped defects (121) increase a diffusion coefficient that is characteristic for the egress of the hydrogen from the reflection layer system (110) by at least 20%, in comparison to a similar layer construction without these channel-shaped defects.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.