Apparatus of plural charged-particle beams
US10062541B2 · kind B2 · utility
26Cited by
8References
79Claims
0Family size
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Key dates
| Filing date | Jan 27, 2017 |
| Grant date | Aug 28, 2018 |
| Priority date | — |
| Expiry date | Mar 4, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.