Lithographic apparatus and method for performing a measurement
US10067068B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2016 |
| Grant date | Sep 4, 2018 |
| Priority date | — |
| Expiry date | Dec 22, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/061
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an illumination system that utilizes illuminating radiation with a wavelength of 2-40 nm. The illumination system includes an optical element that splits the illuminating radiation into a first and a second illuminating radiation and induces a time delay to the first or the second illuminating radiation. A detector detects the radiation that has been scattered by a target structure. The inspection apparatus has a processing unit operable to control a time delay between the first scattered radiation and the second scattered radiation so as to optimize a property of the combined first and second scattered radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.