Optical method and system for measuring isolated features of a structure
US10073045B2 · kind B2 · utility
2Cited by
7References
29Claims
0Family size
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Key dates
| Filing date | Jul 24, 2013 |
| Grant date | Sep 11, 2018 |
| Priority date | — |
| Expiry date | May 11, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical method and system are presented for use in measurement of isolated features of a structure. According to this technique, Back Focal Plane Microscopy (BFM) measurements are applied to a structure and measured data indicative thereof is obtained, wherein the BFM measurements utilize dark-field detection mode while applying pinhole masking to incident light propagating through an illumination channel towards the structure, the measured data being thereby indicative of a scattering matrix characterizing scattering properties of the structure, enabling identification of one or more isolated features of the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.