System and method for regenerating phosphoric acid solution, and apparatus and method for treating substrate
US10083840B2 · kind B2 · utility
1Cited by
2References
9Claims
0Family size
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Key dates
| Filing date | May 27, 2016 |
| Grant date | Sep 25, 2018 |
| Priority date | — |
| Expiry date | May 27, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6708
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Disclosed is a method of regenerating a phosphoric acid solution from a treatment liquid including silicon (Si), hydrogen fluoride (HF), and phosphoric acid, the method including removing the silicon by supplying hydrogen fluoride corresponding to a preset amount or more to the treatment liquid, removing the hydrogen fluoride by heating the treatment liquid to a boiling point of hydrogen fluoride or higher, and adjusting a temperature and a concentration of the phosphoric acid to preset values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.