Test structures for dielectric reliability evaluations

US10103060B2 · kind B2 · utility

Assignee

• GlobalFoundries Inc. · KY

Inventors

• David G. Brochu, JR. · East Hardwick, US
• Roger A. Dufresne · Saint Albans, US
• Baozhen Li · South Bend, US
• Barry P. Linder · Hastings-on-Hudson, US
• James H. Stathis · Poughquag, US
• Ernest Y. Wu · South Burlington, US

Key dates

• Filing date: Jun 18, 2015
• Grant date: Oct 16, 2018
• Expiry date: Nov 20, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L22/34
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Methods and test structures for testing the reliability of a dielectric material. The test structure may include a first row of contacts and a line comprised of a conductor. The line is laterally spaced in a direction at a minimum distance from the first row of contacts. The test structure further includes a second row of contacts laterally spaced in the direction from the first row of contacts by a distance equal to two times a minimum pitch. The line is laterally positioned between the first row of contacts and the second row of contacts.