Apparatus and method for using scanning light beam for film or surface modification
US10108096B2 · kind B2 · utility
1Cited by
9References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2016 |
| Grant date | Oct 23, 2018 |
| Priority date | — |
| Expiry date | Aug 31, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.