Mark Schattenburg
13Patents
6h-index
18Co-inventors
63Inventor score
Filing activity: Feb 25, 1987 → Aug 14, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4890309A | Lithography mask with a .pi.-phase shifting attenuator | Physics | 104 | Expired |
| US6882477B1 | Method and system for interference lithography utilizing phase-locked scanning beams | Physics | 79 | Expired |
| US5142385A | Holographic lithography | Physics | 54 | Expired |
| US5136169A | Energy beam locating | Electricity | 26 | Expired |
| US5809103A | X-ray lithography masking | Physics | 14 | Expired |
| US6822248B2 | Spatial phase locking with shaped electron beam lithography | Electricity | 6 | Expired |
| US8025832B2 | Method for shaping sheet thermoplastic and the like | Performing Operations; Transporting | 3 | Active |
| US10108096B2 | Apparatus and method for using scanning light beam for film or surface modification | Physics | 1 | Active |
| US7492989B2 | Hybrid transmission-reflection grating | Physics | 1 | Active |
| US10503083B2 | Apparatus and method for using scanning light beam for film or surface modification | Physics | 1 | Active |
| US9612534B2 | Exposure dose homogenization through rotation, translation, and variable processing conditions | Chemistry; Metallurgy | 1 | Active |
| US10145672B2 | Detection of position, orientation and scale of work pieces using retroreflective surfaces | Physics | 0 | Active |
| US11879170B2 | Stress patterning systems and methods for manufacturing free-form deformations in thin substrates | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.