Patent · US Active

Illumination system and projection objective of a mask inspection apparatus

US10114293B2 · kind B2 · utility

1Cited by

5References

45Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Heiko Feldmann · Aalen, DE
Erik Matthias Sohmen · Aalen, DE
Joachim Stuehler · Aalen, DE
Oswald Gromer · Heidenheim, DE
Ulrich Mueller · Hamburg, DE
Michael Layh · Altusried, DE
Markus Schwab · Aalen, DE

Key dates

Filing date	Aug 16, 2012
Grant date	Oct 30, 2018
Priority date	—
Expiry date	Nov 16, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/95676
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.