High flow gas diffuser assemblies, systems, and methods
US10119191B2 · kind B2 · utility
2Cited by
35References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 8, 2016 |
| Grant date | Nov 6, 2018 |
| Priority date | — |
| Expiry date | Feb 24, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Porous diffuser assemblies including multiple diffuser elements. The porous diffuser assemblies include a diffuser body, a diffuser base coupled to the diffuser body and forming a plenum there between, the diffuser base including a plurality of openings formed therein, and a porous diffuser element disposed in each of the plurality of openings wherein surfaces of the porous diffuser elements are exposed to the plenum. Gas purged chambers and methods of purging a chamber are disclosed, as are numerous other aspects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.