Catadioptric projection objective comprising deflection mirrors and projection exposure method

US10120176B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Thomas Schicketanz · Aalen, DE
• Toralf Gruner · Hennef (Sieg), DE

Key dates

• Filing date: Oct 13, 2017
• Grant date: Nov 6, 2018
• Expiry date: Oct 13, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70791
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for manufacturing an integrated circuit includes scanning a wafer with respect to a catadioptric projection objective and imaging a pattern on a mask onto a wafer while scanning the wafer. The imaging includes illuminating the mask with radiation; imaging, using the radiation, the pattern into a first intermediate image, the first intermediate image to a second intermediate image, and the second intermediate image into an image field arranged in an image surface where the wafer is arranged; and, manipulating one or more of optical elements while scanning the wafer to reduce errors in the image at the image field. A concave mirror arranged in a region of a pupil surface reflects the radiation. The projection objective also includes mirrors to deflect the radiation from the object field towards the concave mirror and to deflect the radiation from the concave mirror towards the image field. The deflection mirrors are mechanically coupled to a displacement device arranged to displace the first and second deflection mirrors.