Corrosion inhibitors and related compositions and methods

US10124464B2 · kind B2 · utility

Assignee

• Cabot Microelectronics Corporation · US

Inventors

• Mary Cavanaugh · Naperville, US
• Steven Kraft · Abilene, US
• Andrew R. Wolff · Lake Villa, US
• Phillip W. Carter · Naperville, US
• Elise Sikma · Bartlett, US
• Jeffrey Cross · Batavia, US
• Benjamin Petro · St. Charles, US

Key dates

• Filing date: Oct 21, 2015
• Grant date: Nov 13, 2018
• Expiry date: Oct 21, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/3212
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention provides methods of inhibiting corrosion of a substrate containing metal. The substrate can be in any suitable form. In some embodiments, the metal is cobalt. The methods can be used with semiconductor wafers in some embodiments. The invention also provides chemical-mechanical polishing compositions and methods of polishing a substrate. A corrosion inhibitor can be used in the methods and compositions disclosed herein. The inhibitor comprises an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, an amino acid derivative, a phosphate ester, an isethionate, a sulfate, a sulfosuccinate, a sulfocinnimate, or any combination thereof.