Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films

US10128088B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Prashant Kumar Kulshreshtha · San Jose, US
• Ziqing Duan · Sunnyvale, US
• Abdul Aziz Khaja · San Jose, US
• Zheng John Ye · Santa Clara, US
• Amit Kumar BANSAL · Milpitas, US

Key dates

• Filing date: May 27, 2016
• Grant date: Nov 13, 2018
• Expiry date: May 10, 2037

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6831
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present disclosure generally relates to processing chamber seasoning layers having a graded composition. In one example, the seasoning layer is a boron-carbon-nitride (BCN) film. The BCN film may have a greater composition of boron at the base of the film. As the BCN film is deposited, the boron concentration may approach zero, while the relative carbon and nitrogen concentration increases. The BCN film may be deposited by initially co-flowing a boron precursor, a carbon precursor, and a nitrogen precursor. After a first period of time, the flow rate of the boron precursor may be reduced. As the flow rate of boron precursor is reduced, RF power may be applied to generate a plasma during deposition of the seasoning layer.