Inventor · Sunnyvale, CA, US

Ziqing Duan

35Patents
6h-index
41Co-inventors
61Inventor score

Filing activity: Nov 20, 2014 → Jun 6, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US10083834B2 Methods of forming self-aligned vias Electricity 60 Active
US10319636B2 Deposition and treatment of films for patterning Electricity 20 Active
US10319604B2 Methods for self-aligned patterning Electricity 19 Active
US10354916B2 Methods for wordline separation in 3D-NAND devices Electricity 9 Active
US10886172B2 Methods for wordline separation in 3D-NAND devices Electricity 6 Active
US10622251B2 Methods for wordline separation in 3D-NAND devices Electricity 6 Active
US9390910B2 Gas flow profile modulated control of overlay in plasma CVD films Electricity 5 Active
US9711360B2 Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system Electricity 5 Active
US10192775B2 Methods for gapfill in high aspect ratio structures Electricity 5 Active
US10100408B2 Edge hump reduction faceplate by plasma modulation Electricity 3 Active
US10418243B2 Ultra-high modulus and etch selectivity boron-carbon hardmask films Electricity 3 Active
US10403542B2 Methods of forming self-aligned vias and air gaps Electricity 3 Active
US10373822B2 Gas flow profile modulated control of overlay in plasma CVD films Electricity 2 Active
US10410872B2 Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask application Electricity 2 Active
US10559497B2 Seamless tungsten fill by tungsten oxidation-reduction Electricity 2 Active
US10636659B2 Selective deposition for simplified process flow of pillar formation Electricity 2 Active
US10319591B2 Geometric control of bottom-up pillars for patterning applications Electricity 2 Active
US10854511B2 Methods of lowering wordline resistance Physics 1 Active
US11728168B2 Ultra-high modulus and etch selectivity boron-carbon hardmask films Electricity 1 Active
US9837265B2 Gas flow profile modulated control of overlay in plasma CVD films Electricity 1 Active
US11488856B2 Methods for gapfill in high aspect ratio structures Electricity 0 Active
US10128088B2 Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films Electricity 0 Active
US11094544B2 Methods of forming self-aligned vias Electricity 0 Active
US10971364B2 Ultra-high modulus and etch selectivity boron carbon hardmask films Electricity 0 Active
US10840186B2 Methods of forming self-aligned vias and air gaps Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.