Method for determining a process window for a lithographic process, associated apparatuses and a computer program
US10133191B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2015 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Jul 15, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of determining a process window for a lithographic process, the process window describing a degree of acceptable variation in at least one processing parameter during the lithographic process. The method includes obtaining a set of output parameter values derived from measurements performed at a plurality of locations on a substrate, following pattern transfer to the substrate using a lithographic process, and obtaining a corresponding set of actual processing parameter values that includes an actual value of a processing parameter of the lithographic process during the pattern transfer at each of the plurality of locations. The process window is determined from the output parameter values and the actual processing parameter values. This process window may be used to improve the selection of the processing parameter at which a subsequent lithographic process is performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.