Frank Staals
57Patents
5h-index
108Co-inventors
75Inventor score
Filing activity: Jul 16, 2004 → Aug 3, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8582082B2 | Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface | Physics | 8 | Active |
| US8208122B2 | Method of measuring a lithographic projection apparatus | Physics | 7 | Active |
| US10133191B2 | Method for determining a process window for a lithographic process, associated apparatuses and a computer program | Physics | 6 | Active |
| US8554510B2 | Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product | Physics | 5 | Active |
| US8570492B2 | Lithographic apparatus | Physics | 5 | Active |
| US10571806B2 | Method and system to monitor a process apparatus | Electricity | 4 | Active |
| US11067902B2 | Computational metrology | Physics | 4 | Active |
| US7148494B2 | Level sensor, lithographic apparatus and device manufacturing method | Physics | 4 | Expired |
| US9977344B2 | Metrology target, method and apparatus, computer program and lithographic system | Physics | 3 | Active |
| US10691030B2 | Measurement method, inspection apparatus, patterning device, lithographic system and device manufacturing method | Physics | 3 | Active |
| US9696638B2 | Lithographic apparatus | Physics | 3 | Active |
| US8947632B2 | Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate | Physics | 3 | Active |
| US6987555B2 | Lithographic apparatus, device manufacturing method, and device manufactured thereby | Physics | 2 | Expired |
| US9134631B2 | Lithographic apparatus and device manufacturing method | Physics | 2 | Active |
| US10802408B2 | Method for optimization of a lithographic process | Physics | 2 | Active |
| US10571812B2 | Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method | Physics | 2 | Active |
| US11029614B2 | Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus | Physics | 2 | Active |
| US11487209B2 | Method for controlling a lithographic apparatus and associated apparatuses | Physics | 2 | Active |
| US10649342B2 | Method and apparatus for determining a fingerprint of a performance parameter | Electricity | 2 | Active |
| US8208118B2 | Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier | Physics | 1 | Active |
| US10816904B2 | Method for determining contribution to a fingerprint | Electricity | 1 | Active |
| US8975599B2 | Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus | Physics | 1 | Active |
| US11422476B2 | Methods and apparatus for monitoring a lithographic manufacturing process | Physics | 1 | Active |
| US9958789B2 | Method of metrology, inspection apparatus, lithographic system and device manufacturing method | Physics | 1 | Active |
| US11586114B2 | Wavefront optimization for tuning scanner based on performance matching | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.