Methods of forming semiconductor device structures, and related semiconductor device structures, semiconductor devices, and electronic systems
US10141330B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2017 |
| Grant date | Nov 27, 2018 |
| Priority date | — |
| Expiry date | May 26, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of forming a semiconductor device structure comprises forming a stack structure comprising stacked tiers. Each of the stacked tiers comprises a first structure comprising a first material and a second structure comprising a second, different material longitudinally adjacent the first structure. A patterned hard mask structure is formed over the stack structure. Dielectric structures are formed within openings in the patterned hard mask structure. A photoresist structure is formed over the dielectric structures and the patterned hard mask structure. The photoresist structure, the dielectric structures, and the stack structure are subjected to a series of material removal processes to form apertures extending to different depths within the stack structure. Dielectric structures are formed over side surfaces of the stack structure within the apertures. Conductive contact structures are formed to longitudinally extend to bottoms of the apertures. Semiconductor device structures, semiconductor devices, and electronic systems are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.