Lithographic apparatus and a method of operating the apparatus
US10151984B2 · kind B2 · utility
0Cited by
9References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2015 |
| Grant date | Dec 11, 2018 |
| Priority date | — |
| Expiry date | Jul 17, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.