Patent · US Active

Process flagging and cluster detection without requiring reconstruction

US10151985B2 · kind B2 · utility

0Cited by

4References

20Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Remco Dirks · Deurne, NL
Seyed Iman Mossavat · Waalre, NL
Hugo Augustinus Joseph Cramer · Eindhoven, NL

Key dates

Filing date	Dec 13, 2016
Grant date	Dec 11, 2018
Priority date	—
Expiry date	Dec 13, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG06F30/398
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.