Soft pulsing
US10157729B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 23, 2014 |
| Grant date | Dec 18, 2018 |
| Priority date | — |
| Expiry date | Sep 2, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods for soft pulsing are described. One of the systems includes a master radiofrequency (RF) generator for generating a first portion of a master RF signal during a first state and a second portion of the master RF signal during a second state. The master RF signal is a sinusoidal signal. The system further includes an impedance matching circuit coupled to the master RF generator via an RF cable to modify the master RF signal to generate a modified RF signal and a plasma chamber coupled to the impedance matching circuit via an RF transmission line. The plasma chamber is used for generating plasma based on the modified RF signal. A statistical measure of the first portion has a positive or a negative slope.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.