John C. Valcore, Jr.
94Patents
19h-index
34Co-inventors
80Inventor score
Filing activity: Feb 16, 2007 → Feb 13, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9508529B2 | System, method and apparatus for RF power compensation in a plasma processing system | Electricity | 119 | Active |
| US7728602B2 | Harmonic derived arc detector | Electricity | 90 | Active |
| US8890537B2 | Harmonic derived arc detector | Electricity | 55 | Active |
| US9299539B2 | Method and apparatus for measuring wafer bias potential | Electricity | 44 | Active |
| US10102321B2 | System, method and apparatus for refining radio frequency transmission system models | Physics | 44 | Active |
| US9842725B2 | Using modeling to determine ion energy associated with a plasma system | Electricity | 39 | Active |
| US9320126B2 | Determining a value of a variable on an RF transmission model | Electricity | 35 | Active |
| US10469108B2 | Systems and methods for using computer-generated models to reduce reflected power towards a high frequency RF generator during a cycle of operations of a low frequency RF generator | Electricity | 34 | Active |
| US9114666B2 | Methods and apparatus for controlling plasma in a plasma processing system | Electricity | 34 | Active |
| US9779196B2 | Segmenting a model within a plasma system | Physics | 33 | Active |
| US9390893B2 | Sub-pulsing during a state | Electricity | 30 | Active |
| US8901935B2 | Methods and apparatus for detecting the confinement state of plasma in a plasma processing system | Physics | 30 | Active |
| US8501631B2 | Plasma processing system control based on RF voltage | Physics | 29 | Active |
| US9620337B2 | Determining a malfunctioning device in a plasma system | Electricity | 25 | Active |
| US10157729B2 | Soft pulsing | Electricity | 24 | Active |
| US9171699B2 | Impedance-based adjustment of power and frequency | Electricity | 22 | Active |
| US9408288B2 | Edge ramping | Electricity | 21 | Active |
| US9607810B2 | Impedance-based adjustment of power and frequency | Electricity | 21 | Active |
| US9720022B2 | Systems and methods for providing characteristics of an impedance matching model for use with matching networks | Electricity | 19 | Active |
| US10231321B2 | State-based adjustment of power and frequency | Electricity | 18 | Active |
| US9368329B2 | Methods and apparatus for synchronizing RF pulses in a plasma processing system | Electricity | 18 | Active |
| US9197196B2 | State-based adjustment of power and frequency | Electricity | 17 | Active |
| US9711332B2 | Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an RF generator | Electricity | 14 | Active |
| US9620334B2 | Control of etch rate using modeling, feedback and impedance match | Electricity | 13 | Active |
| US9455126B2 | Arrangement for plasma processing system control based on RF voltage | Physics | 13 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.