Optical phase measurement method and system
US10161885B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 2015 |
| Grant date | Dec 25, 2018 |
| Priority date | — |
| Expiry date | Apr 12, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8848
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.