Particle beam system and method for the particle-optical examination of an object

US10163603B2 · kind B2 · utility

Assignee

• Carl Zeiss Microscopy GmbH · DE

Inventors

• Dirk Zeidler · Oberkochen, DE
• Stefan Schubert · Oberkochen, DE

Key dates

• Filing date: Jul 19, 2017
• Grant date: Dec 25, 2018
• Expiry date: Jul 19, 2037

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/2857
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.