Method for forming contact plug layout
US10169521B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 4, 2017 |
| Grant date | Jan 1, 2019 |
| Priority date | — |
| Expiry date | May 18, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D89/10
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for forming a contact plug layout include following steps. (a) Receiving a plurality of active region patterns and a plurality of buried gate patterns that are parallel with each other, and each active region pattern overlaps two buried gate patterns to form two overlapping regions and one contact plug region in between the two overlapping regions in each active region pattern; and (b) forming a contact plug pattern in each contact plug region, the contact plug pattern respectively includes a parallelogram, and an included angle of the parallelogram is not equal to 90°. The contact plug pattern in each active region pattern partially overlaps the two buried gate pattern, respectively. The step (a) to the step (b) are implemented using a computer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.