Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
US10170279B2 · kind B2 · utility
6Cited by
24References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 3, 2014 |
| Grant date | Jan 1, 2019 |
| Priority date | — |
| Expiry date | Aug 31, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.