Patent · US Active

Dummy pattern addition to improve CD uniformity

US10170309B2 · kind B2 · utility

1Cited by

10References

5Claims

0Family size

Assignee

GlobalFoundries Inc. · KY

Inventors

Daniel James Dechene · Watervliet, US
Geng Han · Beijing, CN

Key dates

Filing date	Feb 15, 2017
Grant date	Jan 1, 2019
Priority date	—
Expiry date	Feb 15, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH10D84/903
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A multiple exposure patterning process includes the incorporation of a dummy feature into the integration flow. The dummy feature, which is placed to overlie an existing masking layer and thus does not alter the printed image, improves the critical dimension uniformity (CDU) of main critical (non-dummy) features at the same masking level.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.