Extreme ultraviolet light generation apparatus
US10172225B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 2, 2018 |
| Grant date | Jan 1, 2019 |
| Priority date | — |
| Expiry date | Jan 2, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0084
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.