Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device
US10185217B2 · kind B2 · utility
0Cited by
2References
21Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 27, 2015 |
| Grant date | Jan 22, 2019 |
| Priority date | — |
| Expiry date | Jun 11, 2035 |
Classification
- Technology area (CPC —)General
Abstract
A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.