Substrate processing apparatus
US10186433B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2015 |
| Grant date | Jan 22, 2019 |
| Priority date | — |
| Expiry date | May 27, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B15/02
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Particles can be suppressed from adhering to a substrate. A substrate processing apparatus includes a carry-in/out chamber, a transfer chamber, and a delivery chamber. In the carry-in/out chamber, the substrate is carried in and out with respect to a carrier, and in the transfer chamber, a transfer path for the substrate toward a substrate processing chamber, where a predetermined process is performed on the substrate, is formed. Further, the delivery chamber is arranged between the carry-in/out chamber and the transfer chamber. Moreover, an internal pressure of the delivery chamber is higher than an internal pressure of the carry-in/out chamber and an internal pressure of the transfer chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.