Yuri Paskover
29Patents
5h-index
46Co-inventors
61Inventor score
Filing activity: Oct 30, 2015 → Feb 27, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10197389B2 | Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields | Physics | 13 | Active |
| US9864209B2 | Self-moire target design principles for measuring unresolved device-like pitches | Physics | 9 | Active |
| US10190979B2 | Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures | Physics | 8 | Active |
| US10048132B2 | Simultaneous capturing of overlay signals from multiple targets | Physics | 8 | Active |
| US10824079B2 | Diffraction based overlay scatterometry | Physics | 7 | Active |
| US10401228B2 | Simultaneous capturing of overlay signals from multiple targets | Physics | 4 | Active |
| US11378394B1 | On-the-fly scatterometry overlay metrology target | Physics | 4 | Active |
| US10677588B2 | Localized telecentricity and focus optimization for overlay metrology | Physics | 4 | Active |
| US11119417B2 | Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s) | Physics | 3 | Active |
| US10520832B2 | Topographic phase control for overlay measurement | Electricity | 2 | Active |
| US10444161B2 | Systems and methods for metrology with layer-specific illumination spectra | Physics | 2 | Active |
| US12001148B2 | Enhancing performance of overlay metrology | Electricity | 1 | Active |
| US11592755B2 | Enhancing performance of overlay metrology | Electricity | 1 | Active |
| US10579768B2 | Process compatibility improvement by fill factor modulation | Electricity | 1 | Active |
| US11314173B2 | Topographic phase control for overlay measurement | Electricity | 1 | Active |
| US11841621B2 | Moiré scatterometry overlay | Physics | 1 | Active |
| US11409205B2 | Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices | Electricity | 1 | Active |
| US10101592B2 | Self-moiré target design principles for measuring unresolved device-like pitches | Physics | 1 | Active |
| US10408602B2 | Quality estimation and improvement of imaging metrology targets | Physics | 0 | Active |
| US11101153B2 | Parameter-stable misregistration measurement amelioration in semiconductor devices | Electricity | 0 | Active |
| US10139528B1 | Compound objectives for imaging and scatterometry overlay | Physics | 0 | Active |
| US11852590B1 | Systems and methods for metrology with layer-specific illumination spectra | Physics | 0 | Active |
| US11281111B2 | Off-axis illumination overlay measurement using two-diffracted orders imaging | Physics | 0 | Active |
| US12222199B2 | Systems and methods for measurement of misregistration and amelioration thereof | Electricity | 0 | Active |
| US12422363B2 | Scanning scatterometry overlay metrology | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.