Exposure device and out-of-focus and tilt error compensation method

US10197923B2 · kind B2 · utility

Assignee

• SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD · CN

Inventors

• Feibiao Chen · Shanghai, CN
• Chang Zhou · Shanghai, CN
• Yuefei Chen · Shanghai, CN
• Qi Cheng · Huizhou, CN
• Lei Diao · Nanhu, CN
• Jingchao Qi · Shanghai, CN

Key dates

• Filing date: Jul 13, 2015
• Grant date: Feb 5, 2019
• Expiry date: Jul 13, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/027
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In an exposure apparatus and a method for defocus and tilt error compensation, each of alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) corresponds to and has the same coordinate in the first direction as a respective one of focusing sensors (600a, 600b, 600c, 600d, 600e, 600f), so that each of the alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) is arranged on the same straight line as a respective one of the focusing sensors (600a, 600b, 600c, 600d, 600e, 600f). As such, alignment marks can be characterized with both focusing information and alignment information. This enables the correction of errors in the alignment information and thus achieves defocus and tilt error compensation, resulting in significant improvements in alignment accuracy and the production yield.