Patent · US Active

Shadow mask alignment and management system

US10199660B2 · kind B2 · utility

0Cited by

3References

6Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Byung Sung Kwak · Portland, US
Stefan Bangert · Lauentheil, DE
Ralf Hofmann · Heidenheim, DE
Michael Koenig · Kollow, DE

Key dates

Filing date	Mar 21, 2016
Grant date	Feb 5, 2019
Priority date	—
Expiry date	Nov 5, 2036

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/5313
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.