Lithographic apparatus and device manufacturing method
US10209629B2 · kind B2 · utility
1Cited by
21References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2017 |
| Grant date | Feb 19, 2019 |
| Priority date | — |
| Expiry date | Nov 28, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.