Marcel Beckers
38Patents
6h-index
80Co-inventors
68Inventor score
Filing activity: May 25, 2004 → Feb 15, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7057702B2 | Lithographic apparatus and device manufacturing method | Physics | 80 | Expired |
| US7804577B2 | Lithographic apparatus | Physics | 18 | Active |
| US7411654B2 | Lithographic apparatus and device manufacturing method | Physics | 17 | Expired |
| US8587762B2 | Methods relating to immersion lithography and an immersion lithographic apparatus | Physics | 12 | Active |
| US8451423B2 | Lithographic apparatus and method | Physics | 7 | Active |
| US8421996B2 | Lithographic apparatus | Physics | 6 | Active |
| US7542127B2 | Lithographic apparatus and method for manufacturing a device | Physics | 5 | Expired |
| US7808614B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US9182678B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US8233134B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US7411658B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US7522261B2 | Lithographic apparatus and device manufacturing method | Physics | 3 | Expired |
| US9983489B2 | Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation | Physics | 3 | Active |
| US8953142B2 | Lithographic apparatus, drying device, metrology apparatus and device manufacturing method | Physics | 3 | Active |
| US8462314B2 | Lithographic apparatus and device manufacturing method | Physics | 3 | Active |
| US7271873B2 | Lithographic apparatus and device manufacturing method | Physics | 2 | Expired |
| US7136142B2 | Lithographic apparatus having a gas flushing device | Physics | 2 | Expired |
| US9857695B2 | Lithographic apparatus and device manufacturing method | Physics | 2 | Active |
| US10495984B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Active |
| US8976334B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Active |
| US9036127B2 | Lithographic apparatus | Physics | 1 | Active |
| US10209629B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Active |
| US7072021B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Expired |
| US9477158B2 | Lithographic apparatus and device manufacturing method | Physics | 0 | Active |
| US9606429B2 | Lithographic apparatus, drying device, metrology apparatus and device manufacturing method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.