Patent · US Active

Test structure for use in metrology measurements of patterns

US10216098B2 · kind B2 · utility

7Cited by

1References

18Claims

0Family size

Assignee

NOVA MEASURING INSTRUMENTS INC. · IL

Inventors

Oded Cohen · Kiryat Tivon, IL
Gilad Barak · Rehovot, IL
Igor Turovets · Mevaseret Tsiyon, IL

Key dates

Filing date	Dec 10, 2015
Grant date	Feb 26, 2019
Priority date	—
Expiry date	Feb 12, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01L22/34
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.