Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
US10222701B2 · kind B2 · utility
10Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 18, 2014 |
| Grant date | Mar 5, 2019 |
| Priority date | — |
| Expiry date | Sep 18, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.